alumina zinc oxide sputtering target High density, high even, sputtering process is stability, provide bonding services. alumina zinc oxide sputtering target1,the purity is more than 99.99% ,2,the relative density is more than 99%.3,The size is as following:4,The plate...

alumina zinc oxide sputtering target High density, high even, sputtering process is stability,provide bonding services. alumina zinc oxide sputtering target1,the purity is more than 99.99% ,,2,the relative density is more than 99%.The size is as following:The plate sputtering...

sputtering target with copper base We take pleasure in providing dependable bonding service for our customer sputtering target with copper baseBALEN use  patent  bonding technique to bond  targets for customers,  providing dependable bonding service...

AZO sputtering target with bonding We take pleasure in providing dependable bonding service for our customer AZO sputtering target with bondingBALEN use  patent  bonding technique to bond  targets for customers,  providing dependable bonding service...

ZnO sputtering target high density, high purity ,high even, sputtering process is stability. ZnO sputtering target made by balen have following characteristics:the purity is more than 99.99% ,the relative density is more than 99%.The size is as following:The plate sputtering...

I-ZnO sputtering target I-ZnO sputtering target made by balen means:high density, high even, sputtering process is tability. I-ZnO sputtering target made by balen means:the purity is more than 99.99% ,the relative density is more than 98%.The size is as following:The plate...

I-ZnO sputtering target High density, high even, sputtering process is stability, provide bonding services. I-ZnO sputtering targetthe purity is more than 99.99% ,the relative density is more than 99%.The size is as following:The plate sputtering target:all size within...

GZO sputtering target Our GZO sputtering target is high density, high even low electric resistance, sputtering process is stab GZO sputtering targetThe GZO sputtering target made by balen have following characteristics:the purity is more than 99.99% ,the relative density is more...

I-ZnO sputtering target High density, high even, sputtering process is stability, provide bonding services. I-ZnO sputtering targetthe purity is more than 99.99% ,the relative density is more than 99%.The size is as following:The plate sputtering target:all size within...

GZO sputtering target Our GZO sputtering target is high density, high even low electric resistance, sputtering process is stab GZO sputtering targetThe GZO sputtering target made by balen have following characteristics:the purity is more than 99.99% ,the relative density is more...