alumina zinc oxide sputtering target High density, high even, sputtering process is stability, provide bonding services. alumina zinc oxide sputtering target1,the purity is more than 99.99% ,2,the relative density is more than 99%.3,The size is as following:4,The plate...

sputtering target with copper base We take pleasure in providing dependable bonding service for our customer sputtering target with copper baseBALEN use  patent  bonding technique to bond  targets for customers,  providing dependable bonding service...

AZO sputtering target with bonding We take pleasure in providing dependable bonding service for our customer AZO sputtering target with bondingBALEN use  patent  bonding technique to bond  targets for customers,  providing dependable bonding service...

I-ZnO sputtering target High density, high even, sputtering process is stability, provide bonding services. I-ZnO sputtering targetthe purity is more than 99.99% ,the relative density is more than 99%.The size is as following:The plate sputtering target:all size within...

GZO sputtering target High density, high even, low electric resistance, sputtering process is stability GZO sputtering target the purity is more than 99.99% ,the relative density is more than 99%.The size is as following:The plate sputtering target:all size within...

AZO rotary target High density, high even, low electric resistance, sputtering process is stability AZO rotary target the purity is more than 99.99%the relative density is more than 99%.The size is as following:The plate sputtering target:all size within...

AZO sputtering target High density, high even, low electric resistance, sputtering process is stability AZO sputtering target the purity is more than 99.99% ,the relative density is more than 99%.The size is as following:The plate sputtering target:all size within...

AZO rotary sputtering target High density, high even low electric resistance sputtering process is stability provide bondin AZO rotary sputtering target 1,the purity is more than 99.99%2,the relative density is more than 98%.3,The size is as following:The plate...

ZnO-Al sputtering target High density, high even low electric resistance sputtering process is stability, provide bonding ZnO-Al sputtering targetthe purity is more than 99.99%the relative density is more than 98%.The size is as following:The plate sputtering target:all size...

BALEN sputtering target BALEN-TD-N01 sputtering target is our patented products design for manufacturing high stability and hi BALEN sputtering targetBALEN-TD-N01  sputtering  target is our patented products ,It is a kind of completely new material,sputtering process...