ZnO sputtering target high density, high purity ,high even, sputtering process is stability. ZnO sputtering target made by balen have following characteristics:the purity is more than 99.99% ,the relative density is more than 99%.The size is as following:The plate sputtering...

I-ZnO sputtering target I-ZnO sputtering target made by balen means:high density, high even, sputtering process is tability. I-ZnO sputtering target made by balen means:the purity is more than 99.99% ,the relative density is more than 98%.The size is as following:The plate...

I-ZnO sputtering target High density, high even, sputtering process is stability, provide bonding services. I-ZnO sputtering targetthe purity is more than 99.99% ,the relative density is more than 99%.The size is as following:The plate sputtering target:all size within...

GZO sputtering target Our GZO sputtering target is high density, high even low electric resistance, sputtering process is stab GZO sputtering targetThe GZO sputtering target made by balen have following characteristics:the purity is more than 99.99% ,the relative density is more...

GZO sputtering target Our GZO sputtering target is high density, high even low electric resistance, sputtering process is stab GZO sputtering targetThe GZO sputtering target made by balen have following characteristics:the purity is more than 99.99% ,the relative density is more...

GZO sputtering target Our GZO sputtering target is high density, high even low electric resistance, sputtering process is stab GZO sputtering targetThe GZO sputtering target made by balen have following characteristics:the purity is more than 99.99% ,the relative density is more...

GZO sputtering target Our GZO sputtering target is high density, high even low electric resistance, sputtering process is stab GZO sputtering targetThe GZO sputtering target made by balen have following characteristics:the purity is more than 99.99% ,the relative density is more...

Gallium oxide GZO sputtering target Ga2O3 High density, high even, low electric resistance sputtering process is stability Gallium oxide GZO sputtering targetthe purity is more than 99.99% ,the relative density is more than 99%.The size is as following:The plate sputtering...

AZO rotatable sputtering target Alumina zinc oxide sputtering target high density(+5.5g/cm3), high even, low electric resista AZO rotatable sputtering  targetAlumina zinc oxide sputtering target made by balen have following characteristic:the purity is more than 99.99%...

Alumina zinc oxide sputtering target high density(+5.5g/cm3), high even, low electric resistance, stable sputter process Alumina zinc oxide sputtering target made by balen have following characteristic:the purity is more than 99.99% ,the relative density is more than 99%.The...