GZO sputtering target Our GZO sputtering target is high density, high even low electric resistance, sputtering process is stab GZO sputtering targetThe GZO sputtering target made by balen have following characteristics:the purity is more than 99.99% ,the relative density is more...

GZO sputtering target Our GZO sputtering target is high density, high even low electric resistance, sputtering process is stab GZO sputtering targetThe GZO sputtering target made by balen have following characteristics:the purity is more than 99.99% ,the relative density is more...

Gallium oxide GZO sputtering target Ga2O3 High density, high even, low electric resistance sputtering process is stability Gallium oxide GZO sputtering targetthe purity is more than 99.99% ,the relative density is more than 99%.The size is as following:The plate sputtering...

GZO sputtering target High density, high even, low electric resistance, sputtering process is stability GZO sputtering target the purity is more than 99.99% ,the relative density is more than 99%.The size is as following:The plate sputtering target:all size within...

AZO rotary target High density, high even, low electric resistance, sputtering process is stability AZO rotary target the purity is more than 99.99%the relative density is more than 99%.The size is as following:The plate sputtering target:all size within...

AZO sputtering target High density, high even, low electric resistance, sputtering process is stability AZO sputtering target the purity is more than 99.99% ,the relative density is more than 99%.The size is as following:The plate sputtering target:all size within...

AZO rotary sputtering target High density, high even low electric resistance sputtering process is stability provide bondin AZO rotary sputtering target 1,the purity is more than 99.99%2,the relative density is more than 98%.3,The size is as following:The plate...

ZnO-Al sputtering target High density, high even low electric resistance sputtering process is stability, provide bonding ZnO-Al sputtering targetthe purity is more than 99.99%the relative density is more than 98%.The size is as following:The plate sputtering target:all size...

BALEN sputtering target BALEN-TD-N01 sputtering target is our patented products design for manufacturing high stability and hi BALEN sputtering targetBALEN-TD-N01  sputtering  target is our patented products ,It is a kind of completely new material,sputtering process...

AZO rotatable sputtering target Alumina zinc oxide sputtering target high density(+5.5g/cm3), high even, low electric resista AZO rotatable sputtering  targetAlumina zinc oxide sputtering target made by balen have following characteristic:the purity is more than 99.99%...