alumina zinc oxide sputtering target

alumina zinc oxide sputtering target High density, high even, sputtering process is stability,provide bonding services.

alumina zinc oxide sputtering target

1,the purity is more than 99.99% ,,

2,the relative density is more than 99%.

The size is as following:

The plate sputtering target:

1,all size within 600*300mm*20mm

The cylinder sputtering target:,

2,the diameter:50-400mm

3,the thickness:5-20mm,

4,the height:50-500mm.

alumina zinc oxide sputtering target