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- Company Name : Yixing Balen Optoelectronic Material Co., Ltd.
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Gallium oxide GZO sputtering target
Product Detailed
Related Categories:Oxide
Gallium oxide GZO sputtering target
Ga2O3
High density, high even, low electric resistance
sputtering process is stability
Gallium oxide GZO sputtering target
the purity is more than 99.99% ,
the relative density is more than 99%.
The size is as following:
The plate sputtering target:
all size within 600*300mm*20mm
The cylinder sputtering target:
the diameter:50-400mm
the thickness:5-20mm
the height:50-500mm.Gallium oxide GZO sputtering target
